Microstructured Nanostructures – nanostructuring by means of conventional photolithography and layer-expansion technique

  • A new and simple method for nanostructuring using conventional photolithography and layer expansion or pattern-size reduction technique is presented, which can further be applied for the fabrication of different nanostructures and nano-devices. The method is based on the conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size resolution using thermal oxidation. With this technique, the pattern size can be scaled down to several nanometer dimensions. The proposed method is experimentally demonstrated by preparing nanostructures with different configurations and layouts, like circles, rectangles, trapezoids, “fluidic-channel”-, “cantilever”- and meander-type structures.

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Metadaten
Author:Johannes Platen, Arshak PoghossianORCiD, Michael Josef SchöningORCiD
URN:urn:nbn:de:hbz:a96-opus-1477
DOI:https://doi.org/10.21269/117
Document Type:Conference Proceeding
Language:English
Year of Completion:2006
Publishing Institution:Fachhochschule Aachen
Contributing Corporation:International Symposium on Sensor Science, I3S 2005 <3; 2005; Juelich, Germany>
Date of the Publication (Server):2006/05/22
Tag:Nanostructuring; layer expansion; pattern-size reduction; self-aligned patterning
GND Keyword:Biosensor
Source:http://www.mdpi.org/sensors/papers/s6040361.pdf
Institutes:FH Aachen / Fachbereich Medizintechnik und Technomathematik
FH Aachen / INB - Institut für Nano- und Biotechnologien
Dewey Decimal Classification:5 Naturwissenschaften und Mathematik / 57 Biowissenschaften; Biologie / 570 Biowissenschaften; Biologie
collections:FH Aachen / International Symposium on Sensor Science, I3S 2005 <3; 2005; Ju