TY  - JOUR
A1  - Moret, J.L.T.M.
A1  - Alkemade, J.
A1  - Upcraft, T.M.
A1  - Paulßen, Elisabeth
A1  - Wolterbeek, H.T.
A1  - Ommen, J.R. van
A1  - Denkova, A.G.
T1  - The application of atomic layer deposition in the production of sorbents for ⁹⁹Mo/⁹⁹ᵐTc generator
JF  - Applied Radiation and Isotopes
N2  - New production routes for ⁹⁹Mo are steadily gaining importance. However, the obtained specific activity is much lower than currently produced by the fission of U-235. To be able to supply hospitals with ⁹⁹Mo/⁹⁹ᵐTc generators with the desired activity, the adsorption capacity of the column material should be increased. In this paper we have investigated whether the gas phase coating technique Atomic Layer Deposition (ALD), which can deposit ultra-thin layers on high surface area materials, can be used to attain materials with high adsorption capacity for ⁹⁹Mo. For this purpose, ALD was applied on a silica-core sorbent material to coat it with a thin layer of alumina. This sorbent material shows to have a maximum adsorption capacity of 120 mg/g and has a ⁹⁹ᵐTc elution efficiency of 55 ± 2% based on 3 executive elutions.
Y1  - 2020
U6  - http://dx.doi.org/10.1016/j.apradiso.2020.109266
SN  - 0969-8043
VL  - 164
IS  - 109266
PB  - Elsevier
CY  - Amsterdam
ER  -