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Cranial fixation plates in cerebral magnetic resonance imaging: a 3 and 7 Tesla in vivo image quality study

  • Objective This study assesses and quantifies impairment of postoperative magnetic resonance imaging (MRI) at 7 Tesla (T) after implantation of titanium cranial fixation plates (CFPs) for neurosurgical bone flap fixation. Materials and methods The study group comprised five patients who were intra-individually examined with 3 and 7 T MRI preoperatively and postoperatively (within 72 h/3 months) after implantation of CFPs. Acquired sequences included T₁-weighted magnetization-prepared rapid-acquisition gradient-echo (MPRAGE), T₂-weighted turbo-spin-echo (TSE) imaging, and susceptibility-weighted imaging (SWI). Two experienced neurosurgeons and a neuroradiologist rated image quality and the presence of artifacts in consensus reading. Results Minor artifacts occurred around the CFPs in MPRAGE and T2 TSE at both field strengths, with no significant differences between 3 and 7 T. In SWI, artifacts were accentuated in the early postoperative scans at both field strengths due to intracranial air and hemorrhagic remnants. After resorption, the brain tissue directly adjacent to skull bone could still be assessed. Image quality after 3 months was equal to the preoperative examinations at 3 and 7 T. Conclusion Image quality after CFP implantation was not significantly impaired in 7 T MRI, and artifacts were comparable to those in 3 T MRI.

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Metadaten
Author:Bixia Chen, Tobias Schoemberg, Oliver Kraff, Philipp Dammann, Andreas Bitz, Marc Schlamann, Harald H. Quick, Mark E. Ladd, Ulrich Sure, Karsten H. Wrede
DOI:https://doi.org/10.1007/s10334-016-0548-1
ISSN:1352-8661
Parent Title (English):Magnetic Resonance Materials in Physics, Biology and Medicine
Publisher:Springer
Place of publication:Berlin
Document Type:Article
Language:English
Year of Completion:2016
Date of the Publication (Server):2017/03/30
Volume:29
Issue:3
First Page:389
Last Page:398
Link:10.1007/s10334-016-0548-1
Zugriffsart:weltweit
Institutes:FH Aachen / Fachbereich Elektrotechnik und Informationstechnik
collections:Verlag / Springer