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Safety of subjects during radiofrequency exposure in ultra-high-field magnetic resonance imaging

  • Magnetic resonance imaging (MRI) is one of the most important medical imaging techniques. Since the introduction of MRI in the mid-1980s, there has been a continuous trend toward higher static magnetic fields to obtain i.a. a higher signal-to-noise ratio. The step toward ultra-high-field (UHF) MRI at 7 Tesla and higher, however, creates several challenges regarding the homogeneity of the spin excitation RF transmit field and the RF exposure of the subject. In UHF MRI systems, the wavelength of the RF field is in the range of the diameter of the human body, which can result in inhomogeneous spin excitation and local SAR hotspots. To optimize the homogeneity in a region of interest, UHF MRI systems use parallel transmit systems with multiple transmit antennas and time-dependent modulation of the RF signal in the individual transmit channels. Furthermore, SAR increases with increasing field strength, while the SAR limits remain unchanged. Two different approaches to generate the RF transmit field in UHF systems using antenna arrays close and remote to the body are investigated in this letter. Achievable imaging performance is evaluated compared to typical clinical RF transmit systems at lower field strength. The evaluation has been performed under consideration of RF exposure based on local SAR and tissue temperature. Furthermore, results for thermal dose as an alternative RF exposure metric are presented.

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Metadaten
Verfasserangaben:Thomas M. Fiedler, Mark E. Ladd, Markus Clemens, Andreas Bitz
DOI:https://doi.org/10.1109/LEMCPA.2020.3029747
ISBN:2637-6423
Titel des übergeordneten Werkes (Englisch):IEEE Letters on Electromagnetic Compatibility Practice and Applications
Verlag:IEEE
Verlagsort:New York, NY
Dokumentart:Wissenschaftlicher Artikel
Sprache:Englisch
Erscheinungsjahr:2020
Datum der Publikation (Server):19.10.2020
Jahrgang:2
Ausgabe / Heft:3
Erste Seite:1
Letzte Seite:8
Link:https://doi.org/10.1109/LEMCPA.2020.3029747
Zugriffsart:campus
Fachbereiche und Einrichtungen:FH Aachen / Fachbereich Elektrotechnik und Informationstechnik
collections:Verlag / IEEE