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The application of atomic layer deposition in the production of sorbents for ⁹⁹Mo/⁹⁹ᵐTc generator

  • New production routes for ⁹⁹Mo are steadily gaining importance. However, the obtained specific activity is much lower than currently produced by the fission of U-235. To be able to supply hospitals with ⁹⁹Mo/⁹⁹ᵐTc generators with the desired activity, the adsorption capacity of the column material should be increased. In this paper we have investigated whether the gas phase coating technique Atomic Layer Deposition (ALD), which can deposit ultra-thin layers on high surface area materials, can be used to attain materials with high adsorption capacity for ⁹⁹Mo. For this purpose, ALD was applied on a silica-core sorbent material to coat it with a thin layer of alumina. This sorbent material shows to have a maximum adsorption capacity of 120 mg/g and has a ⁹⁹ᵐTc elution efficiency of 55 ± 2% based on 3 executive elutions.

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Metadaten
Verfasserangaben:J.L.T.M. Moret, J. Alkemade, T.M. Upcraft, Elisabeth PaulßenORCiD, H.T. Wolterbeek, J.R. van Ommen, A.G. Denkova
DOI:https://doi.org/10.1016/j.apradiso.2020.109266
ISSN:0969-8043
Titel des übergeordneten Werkes (Englisch):Applied Radiation and Isotopes
Verlag:Elsevier
Verlagsort:Amsterdam
Dokumentart:Wissenschaftlicher Artikel
Sprache:Englisch
Erscheinungsjahr:2020
Datum der Publikation (Server):27.07.2020
Jahrgang:164
Ausgabe / Heft:109266
Umfang:9
Link:https://doi.org/10.1016/j.apradiso.2020.109266
Zugriffsart:weltweit
Fachbereiche und Einrichtungen:FH Aachen / Fachbereich Chemie und Biotechnologie
open_access (DINI-Set):open_access
collections:Verlag / Elsevier
Open Access / Hybrid
Lizenz (Deutsch): Creative Commons - Namensnennung