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A new and simple method for nanostructuring using conventional photolithography and layer expansion or pattern-size reduction technique is presented, which can further be applied for the fabrication of different nanostructures and nano-devices. The method is based on the conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size resolution using thermal oxidation. With this technique, the pattern size can be scaled down to several nanometer dimensions. The proposed method is experimentally demonstrated by preparing nanostructures with different configurations and layouts, like circles, rectangles, trapezoids, “fluidic-channel”-, “cantilever”- and meander-type structures.
Functional testing and characterisation of ISFETs on wafer level by means of a micro-droplet cell
(2006)
A wafer-level functionality testing and characterisation system for ISFETs (ionsensitive field-effect transistor) is realised by means of integration of a specifically designed capillary electrochemical micro-droplet cell into a commercial wafer prober-station. The developed system allows the identification and selection of “good” ISFETs at the earliest stage and to avoid expensive bonding, encapsulation and packaging processes for nonfunctioning ISFETs and thus, to decrease costs, which are wasted for bad dies. The developed system is also feasible for wafer-level characterisation of ISFETs in terms of sensitivity, hysteresis and response time. Additionally, the system might be also utilised for wafer-level testing of further electrochemical sensors.
In: Computer Aided Architectural Design Futures 2005 2005, Part 4, 207-216, DOI: http://dx.doi.org/10.1007/1-4020-3698-1_19 The conceptual design at the beginning of the building construction process is essential for the success of a building project. Even if some CAD tools allow elaborating conceptual sketches, they rather focus on the shape of the building elements and not on their functionality. We introduce semantic roomobjects and roomlinks, by way of example to the CAD tool ArchiCAD. These extensions provide a basis for specifying the organisation and functionality of a building and free architects being forced to directly produce detailed constructive sketches. Furthermore, we introduce consistency analyses of the conceptual sketch, based on an ontology containing conceptual relevant knowledge, specific to one class of buildings.
Proc. of the 2005 ASCE Intl. Conf. on Computing in Civil Engineering (ICCC 2005) eds. L. Soibelman und F. Pena-Mora, Seite 1-14, ASCE (CD-ROM), Cancun, Mexico, 2005 Current CAD tools are not able to support the fundamental conceptual design phase, and none of them provides consistency analyses of sketches produced by architects. To give architects a greater support at the conceptual design phase, we develop a CAD tool for conceptual design and a knowledge specification tool allowing the definition of conceptually relevant knowledge. The knowledge is specific to one class of buildings and can be reused. Based on a dynamic knowledge model, different types of design rules formalize the knowledge in a graph-based realization. An expressive visual language provides a user-friendly, human readable representation. Finally, consistency analyses enable conceptual designs to be checked against this defined knowledge. In this paper we concentrate on the knowledge specification part of our project.