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A light-addressable potentiometric sensor (LAPS) is a field-effect-based (bio-) chemical sensor, in which a desired sensing area on the sensor surface can be defined by illumination. Light addressability can be used to visualize the concentration and spatial distribution of the target molecules, e.g., H+ ions. This unique feature has great potential for the label-free imaging of the metabolic activity of living organisms. The cultivation of those organisms needs specially tailored surface properties of the sensor. O2 plasma treatment is an attractive and promising tool for rapid surface engineering. However, the potential impacts of the technique are carefully investigated for the sensors that suffer from plasma-induced damage. Herein, a LAPS with a Ta2O5 pH-sensitive surface is successfully patterned by plasma treatment, and its effects are investigated by contact angle and scanning LAPS measurements. The plasma duration of 30 s (30 W) is found to be the threshold value, where excessive wettability begins. Furthermore, this treatment approach causes moderate plasma-induced damage, which can be reduced by thermal annealing (10 min at 300 °C). These findings provide a useful guideline to support future studies, where the LAPS surface is desired to be more hydrophilic by O2 plasma treatment.
Photoelectrochemical (PEC) biosensors are a rather novel type of biosensors thatutilizelighttoprovideinformationaboutthecompositionofananalyte,enablinglight-controlled multi-analyte measurements. For enzymatic PEC biosensors,amperometric detection principles are already known in the literature. In con-trast, there is only a little information on H+-ion sensitive PEC biosensors. Inthis work, we demonstrate the detection of H+ions emerged by H+-generatingenzymes, exemplarily demonstrated with penicillinase as a model enzyme on atitanium dioxide photoanode. First, we describe the pH sensitivity of the sensorand study possible photoelectrocatalytic reactions with penicillin. Second, weshow the enzymatic PEC detection of penicillin.
Proceedings of the 2nd Humboldt Kolleg, Hammamet, Tunisia Organizer: Alexander von Humboldt Stiftung, Germany. pdf 184 p. Welcome Address Dear Participants, Welcome to the 2nd Humboldt Kolleg in “Nanoscale Science and Technology” (NS&T’12) in Tunisia, sponsored by the "Alexander von Humboldt" foundation. The NS&T’12 multidisciplinary scientific program includes seven "hot" topics dealing with "Nanoscale Science and Technology" covering basic and application-oriented research as well as industrial (market) aspects: - Molecular Biophyics, Spectroscopy Techniques, Imaging Microscopy - Nanomaterials Synthesis for Medicine and Bio-chemical Sensors - Nanostructures, Semiconductors, Photonics and Nanodevices - New Technologies in Market Industry - Environment, Electro-chemistry, Bio-polymers and Fuel Cells - Nanomaterials, Photovoltaic, Modelling, Quantum Physics - Microelectronics, Sensors Networks and Embedded Systems We are deeply indebted to all members of the Scientific Committee and General Chairs for joint Sessions and to all speakers and chairmen, who have dedicated invaluable time and efforts for the realization of this event. On behalf of the Organizing Committee, we are cordially inviting you to join the conference and hope that your stay will be fruitful, rewarding and enjoyable. Prof. Dr. Michael J. Schöning, Prof. Dr. Adnane Abdelghani
Doktoranden der FH Aachen stellen ihre wissenschaftlichen Arbeiten aus verschiedenen Fachdisziplinen vor.
Functional testing and characterisation of ISFETs on wafer level by means of a micro-droplet cell
(2006)
A wafer-level functionality testing and characterisation system for ISFETs (ionsensitive field-effect transistor) is realised by means of integration of a specifically designed capillary electrochemical micro-droplet cell into a commercial wafer prober-station. The developed system allows the identification and selection of “good” ISFETs at the earliest stage and to avoid expensive bonding, encapsulation and packaging processes for nonfunctioning ISFETs and thus, to decrease costs, which are wasted for bad dies. The developed system is also feasible for wafer-level characterisation of ISFETs in terms of sensitivity, hysteresis and response time. Additionally, the system might be also utilised for wafer-level testing of further electrochemical sensors.
A new and simple method for nanostructuring using conventional photolithography and layer expansion or pattern-size reduction technique is presented, which can further be applied for the fabrication of different nanostructures and nano-devices. The method is based on the conversion of a photolithographically patterned metal layer to a metal-oxide mask with improved pattern-size resolution using thermal oxidation. With this technique, the pattern size can be scaled down to several nanometer dimensions. The proposed method is experimentally demonstrated by preparing nanostructures with different configurations and layouts, like circles, rectangles, trapezoids, “fluidic-channel”-, “cantilever”- and meander-type structures.